Photomask Cleaning System
MC150 series and ARTS™

Equipped with a Freeze Cleaning Function
Single-Wafer Photomask Cleaning System Applicable to 6025

This single-wafer cleaning system supports wide range products from next-generation EUV photomasks to legacy products. Equipped with the freeze cleaning function that is implemented by our company, this system achieves both fine foreign material removal performance and pattern damage-free feature. This contributes to the improvement of the yield of photomasks where pattern miniaturization is progressing.

Features

For glass cleaning for sizes other than 6025 (152 x 152 x 6.3mm)

Panel Spin Cleaning System

Features

Freeze Cleaning Function

Utilizing a property of ultrapure water that expands during the freezing process, this cleaning technology achieves a pattern damage-free feature through selective removal of foreign matter.

Supports a Variety of Photomasks by Applying the Cleaning

Technology optimized for each photomask, this system supports a variety of photomasks including next generation EUV and NIL. It also supports mask blanks cleaning.

Various Process Modules Available for Selection

In addition to the freeze cleaning function, various processing modules are available to be installed including an end face cleaning function. In this way, we support various customer requirements.