Photomask Cleaning Equipment
MC150 and ARTS
Equipped with a freeze cleaning function
Single-wafer photomask cleaning equipment applicable to 6025
Contact Us
This single-wafer cleaning equipment supports products ranging from next-generation EUV photomasks to legacy products. Equipped with the freeze cleaning function that is implemented by our company, this equipment achieves both fine foreign material removal performance and pattern damage-free feature. This contributes to the improvement of the yield of photomasks where pattern mycorrhization is progressing.
Features
- ・Freeze cleaning function
By using the characteristics of ultrapure water that expands in the process of freezing, this cleaning technology realized a pattern damage-free feature by removing foreign materials selectively.
- ・Supports a variety of photomasks By applying the cleaning
technology optimized for each photomask, this equipment supports a variety of photomasks including next generation EUV and NIL. It also supports mask blanks cleaning.
- ・Various process modules available for selection
In addition to the freeze cleaning function, various processing modules are available to be installed including an end face cleaning function. In this way, we support various customer requirements.
Loading port that supports SMIFSupports SMIF POD (Single and Multi)
Freeze cleaning processOur unique cleaning chamber
