Sputtering
Equipment for Optical Communication Devices
（CFS-12P-LL-90D）
Sputtering Equipment for Optical Communication Devices
・Excellent process stability for a variety products
Application example
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Si photonics
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LED (wiring, electrode and protective films)
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Various wafer thin film pattern formation
Features
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Process Stability
Inheriting the process of the batch-type sputtering equipment CFS-12P-90H, and equipped with a load-lock chamber. It has achieved high process stability.
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High Uniformity
High Uniformity is achieved by the self-Rotating sputtering method
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Film Quality Control
Heating and Bias sputtering enable film Quality Control
Inquiries about Products
