Spin Cleaning Equipment for Low-Temperature Polysilicon LCDs

Ideal for cleaning low- temperature polysilicon TFT; matches the cleaning performance required for semiconductor manufacturing.

Features

Minimized cross contamination
Cuts cross contamination, a potential problem in LTPS manufacturing, to the level demanded for semiconductor manufacturing equipment.
Low COO
Realizes “eco-friendly cleaning” by reducing the installation space to 1/5 and minimizing the use of chemicals and pure water.
New process based on electro-chemical principles
Realizes rationalized removal of contaminants by a combination of functional water, acid chemicals and our original “Megasonic” process.

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