Multipurpose Sputtering Equipment
CFS-12P-LL-90D / CFS-12P-90H
Excellent Process Stability for a Variety Products
This unit achieves excellent uniformity through a proprietary film formation method. It enables wide-ranging film quality control, with versatile of functions (heating and etching).
Applications
- LED (wiring, electrode and protective films)
- Various sensors
- Various wafer thin film pattern formation
- Communication Device
Features
Excellent uniformity
Achieves excellent uniformity through a proprietary film formation method.
Versatile Process
Supports automatic conveyance, automatic variable distance from target to substrate, simultaneous sputtering and bias sputtering, etc.
Process Stability (CFS-12P-LL-90D)
Load lock chamber (cassette chamber) allows it to achieve excellent process stability.
Related Information
Contact Us
The Division in Charge of This Product
- Mechatronics System Division