Single Wafer Photomask Wet Cleaning Equipment

Single Wafer Photomask Wet Cleaning Equipment

Single Wafer Photomask Wet Cleaning Equipment

Cleans photo masks using chemicals and pure water to remove dust and stains attached in the pattern forming process from the photo mask.

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Features

  • High performance
    Highly efficient cleaning with hot chemicals
    High-purity cleaning with original "Chemical Megasonic”
    Improved chemical resistance due to metal-free structure
  • Low COO
    Reduced consumption of pure water and chemicals by single-wafer spinning
    Small footprint
  • Expandability
    Integration of spin unit, photo cleaning unit and IPA vapor drying unit
    Applicable to various communications systems

PAGETOP