Advanced Reticle Etching System

Advanced Reticle Etching System (ARES)

Advanced Reticle Etching System

ARES series is a reticle etching equipment for photomasks providing key solution for next generation semiconductor process.

Contact Us

Features

  • ARES series provides advanced reticle (mask) etching applications for photomask (Cr blanks, PSM, HM-PSM) and EUV, NIL masks
  • Maximum chamber number: 4chambers (Flexible hardware configuration)
  • Shibaura’s original plasma source minimize the CD uniformity and linearity and provide No.1 etching performance for each application.

PAGETOP