Single Wafer Wet Cleaning Equipment

Single Wafer Wet Cleaning Equipment

Single Wafer Wet Cleaning Equipment

Cleans wafers using chemicals and pure water to remove dust and stains that cause defects in the semiconductor wafer manufacturing process.

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Features

  • High performance
    High levels of cleanliness and high uniformity by single wafer cleaning
    Free from cross contamination
  • Low COO
    Chemical costs reduced by utilization of functional water
    Wet cleaning with small volume of chemicals Small footprint
  • Environmentally friendly
    RCA-free cleaning and low chemical consumption
    Energy saving process with room temperature cleaning

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