H3PO4 Single Wet Processor

H3PO4 Single Wet Processor

H3PO4 Single Wet Processor

The manufacturing process for semiconductor wafers involves highly accurate etching of nitride film. Following that, this equipment uses a variety of liquid solutions and a physical cleaning tool to remove the dust and dirt that cause defects.

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Features

  • High selectivity etching
    Silicate concentration is monitored and controlled.
  • Uniformity control in whole wafer surface
    Etching profile is controlled by wafer temperature control by each zones.
  • Excellent cleaning function (Shibaura’s original cleaning tool)
    Several cleaning tool can be equipped (Two fluid nozzle, Ultra sonic nozzle)
  • Low materials cost
    A chemical reuse function is available

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